
FOLLOWUS
School of Electronics and Information Engineering, Anhui University, Hefei 230601, China
[ "Shou-biao TAN, E-mail: tsb@ustc.edu" ]
[ "Wen-juan LU, E-mail: luwenjuan@yeah.net" ]
Chun-yu PENG, E-mail: cyupeng@ahu.edu.cn
收稿:2014-12-28,
修回:2015-07-20,
纸质出版:2015-08
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用于低电压下SRAM灵敏放大器工艺变化鲁棒性时序的多级双复制位线延迟技术[J]. 信息与电子工程前沿(英文), 2015,16(8):700-706.
TAN Shou-biao, LU Wen-juan, PENG Chun-yu, et al. Multi-stage dual replica bit-line delay technique for process-variation-robust timing of low voltage SRAM sense amplifier[J]. Frontiers of Information Technology & Electronic Engineering, 2015, 16(8): 700-706.
用于低电压下SRAM灵敏放大器工艺变化鲁棒性时序的多级双复制位线延迟技术[J]. 信息与电子工程前沿(英文), 2015,16(8):700-706. DOI: 10.1631/FITEE.1400439.
TAN Shou-biao, LU Wen-juan, PENG Chun-yu, et al. Multi-stage dual replica bit-line delay technique for process-variation-robust timing of low voltage SRAM sense amplifier[J]. Frontiers of Information Technology & Electronic Engineering, 2015, 16(8): 700-706. DOI: 10.1631/FITEE.1400439.
目的
2
针对低电压下传统SRAM灵敏放大器控制时序受工艺、温度变化而引起的较大的控制时序的波动,设计一种基于多级双复制位线延迟技术的控制时序产生电路。
创新点
2
同时采用多级和双复制位线技术,充分发挥两者在降低控制时序变化方面的优点,取得整体上的改进。
方法
2
首先,分析现有复制位线延迟技术,从统计学角度对各技术之间的关系进行分析,进而提出一种基于多级双复制位线延迟技术的控制时序产生电路(图5)。然后,针对所提电路与现有技术在最差条件下进行蒙特卡洛仿真对比,得出所提技术在最差工作条件下,与现有技术相比具有更好的鲁棒性(图8)。最后在电压、工艺角以及温度分别变化时,对所提电路设计与现有的电路进行性能对比
得出在工艺、电压及温度变化时,所提电路具有更好的稳定性(图9-11)。
结论
2
针对低电压SRAM灵敏放大器控制时序在工艺、电压以及温度变化产生的波动,提出一种多级双复制位线延迟技术,实现进一步降低灵敏放大器控制时序波动的效果。
A multi-stage dual replica bit-line delay (MDRBD) technique is proposed for reducing access time by suppressing the sense-amplifier enable (SAE) timing variation of low voltage static random-access memory (SRAM) applications. Compared with the traditional technique
this strategy
using statistical theory
reduces the timing variation by using multi-stage ideas
meanwhile doubling the replica bit-line (RBL) capacitance and discharge path simultaneously in each stage. At a supply voltage of 0.6 V
the simulation results show that the standard deviations of the SAE timing and cycle time with the proposed technique are 69.2% and 47.2%
respectively
smaller than that with a conventional RBL delay technique in TSMC 65 nm CMOS technology (Taiwan Semiconductor Manufacturing Company
Taiwan).
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